AS ISO 17560: 10/20/2006 Surface chemical analysis – Secondary-ion mass spectrometry – Method for depth profiling of boron in silicon
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Surface chemical analysis – Secondary-ion mass spectrometry – Method for depth profiling of boron in silicon 10/20/2006
ISBN(s): 0733777872
Adopts ISO 17560:2002 to specify a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon and using stylus profilometry or optical interferometry for depth scale calibration.
Attributes
| Edition | 1st |
|---|---|
| Published | 10/20/2006 |
| ISBN(s) | 0733777872 |
| Number of Pages | 10 |
| File Size | 1 file, 770 KB |
| Product Code(s) | 10090409, 10090404, 10090419 |
| Note | This product is unavailable in Ukraine, Russia, Belarus |
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